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Phase 4: Semiconductor EquipmentSubject 11
Deposition Equipment
Explore the machines behind thin film deposition — CVD chambers, PVD systems, and ALD reactors and how they achieve atomic-level precision.
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0 of 4 chapters completeChapters
1
CVD Equipment
Chamber design, gas delivery, plasma sources, and temperature control
2 sections
2
PVD Systems
Magnetron sputtering, target design, and ionized PVD
1 section
3
ALD Reactors
Pulse-purge systems, spatial ALD, and batch vs single-wafer designs
1 section
4
Epitaxy Systems
Si and SiGe epi reactors, design, and in-situ monitoring
1 section