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Phase 4: Semiconductor EquipmentSubject 13
Etch & Clean Equipment
Discover the equipment that precisely removes materials — plasma etch chambers, wet benches, and post-etch cleaning systems.
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0 of 4 chapters completeChapters
1
Plasma Etch Chambers
CCP vs ICP, RF power delivery, and gas distribution
2 sections
2
Etch Process Control
Endpoint detection, OES, and maintaining uniformity
2 sections
3
Wet Clean Systems
Chemical cleaning sequences, megasonic cleaning, and single-wafer tools
2 sections
4
Dry Clean & Strip
Plasma ashing, downstream plasma, and resist removal
2 sections