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Phase 3: Manufacturing Deep DiveSubject 9
Etching & Ion Implantation
Learn how material is selectively removed through etching and how dopant atoms are precisely placed via ion implantation.
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0 of 4 chapters completeChapters
1
Wet vs Dry Etching
Chemical wet etch, isotropic vs anisotropic, and selectivity
1 section
2
Plasma Etching
RIE, ICP, etch chemistry, and profile control
2 sections
3
Ion Implantation
How dopant atoms are precisely placed into silicon
2 sections
4
Annealing & Activation
Repairing implant damage and activating dopants
1 section